Plasma Reactor (Barrel Chamber) (PR200)
Compact, Barrel Type, Low Temperature Ashing Device
Features of Plasma Reactor (Barrel Chamber) (PR200)
- Wide range of application such as ashing, etching, dry cleaning, etc.
- RF Power: 200W
- Space-saving due to the compact design
- Adjustable RF power for various application
- Flexible setting range of output to cope with a variety of testings
Specifications
| Item Code | 215016 |
|---|---|
| Model | PR200 |
| System | DP mode, Barrel type |
| High Frequency Output | Max. 200W |
| Oscillation Frequency | 13.56MHz |
| Tuning Method | Automatic |
| Reaction Chamber | Pyrex Glass φ100× L160mm |
| Reaction Gas System | 1 system (oxygen), flow meter |
| Control System | Manual leakage bulb |
| Piping Material | SUS、Teflon |
| External Dimensions | W350 × D400× H500mm (without projection） |
| Accessory | Sample shelf |
| Internal dimensions（φ×D mm） | φ100×160mm |
| External dimensions（W×D×H mm） | 350×400×500mm |
| Remarks(dimensions) | 00 |
| Power Source |
AC115VV /AC220V |
| Weight | 25kg |
Maintenance and warranty
Conditions: temperature and humidity: 23 deg.C+/-5 deg.C, 65%RH+/-20% (no load)
External dimensions do not include protrusions.
